99
Q.-C. Hsu, Y.-T. Lin and D.-C. Chou, Study on Nanoimprint Formability for the (CH2)n Polymer Material with All-Atom Mode by Molecular, 23rd International Microprocesses and Nanotechnology Conference (MNC 2010), Paper No.216, November 9-12, 2010, Kokura, Japan. (NSC 97-2221-E-151-017)
0000-00-00
0000-00-00